Modeling an inductively coupled plasma reactor with chlorine chemistry

Author

Vitello, P. ; Bardsley, J.N. ; DiPeso, G. ; Parker, G.J.

Author_Institution

Lawrence Livermore Nat. Lab., CA, USA

Volume

24

Issue

1

fYear

1996

fDate

2/1/1996 12:00:00 AM

Firstpage

123

Lastpage

124

Abstract

Inductively coupled plasma reactors are now one of the most important of the high-density plasma processing tools that have been developed in recent years. We present results from a two-dimensional (2-D) time-dependent fluid model of a chlorine plasma discharge. The steady-state values for the plasma potential, and the ion fluxes for Cl ₂⁺ and Cl^- are shown for a simulation of the Lawrence Livermore National Laboratory (LLNL) large area inductively coupled reactor experiment. The counter streaming of positive and negative ions is evident. The flux of Cl₂⁺ is highly uniform over the lower surface of the reactor

Keywords

chemical reactions; chlorine; discharges (electric); plasma devices; plasma simulation; Cl₂; Cl₂ chemistry; Cl₂ plasma discharge; high-density plasma processing tools; inductively coupled plasma reactor; ion counter streaming; ion flux; modeling; plasma potential; simulation; two-dimensional time-dependent fluid model; Coupling circuits; Etching; Inductors; Plasma applications; Plasma chemistry; Plasma devices; Plasma materials processing; Plasma simulation; Poisson equations; Steady-state;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/27.491743

Filename

491743