Title :
Modeling an inductively coupled plasma reactor with chlorine chemistry
Author :
Vitello, P. ; Bardsley, J.N. ; DiPeso, G. ; Parker, G.J.
Author_Institution :
Lawrence Livermore Nat. Lab., CA, USA
fDate :
2/1/1996 12:00:00 AM
Abstract :
Inductively coupled plasma reactors are now one of the most important of the high-density plasma processing tools that have been developed in recent years. We present results from a two-dimensional (2-D) time-dependent fluid model of a chlorine plasma discharge. The steady-state values for the plasma potential, and the ion fluxes for Cl 2+ and Cl- are shown for a simulation of the Lawrence Livermore National Laboratory (LLNL) large area inductively coupled reactor experiment. The counter streaming of positive and negative ions is evident. The flux of Cl2+ is highly uniform over the lower surface of the reactor
Keywords :
chemical reactions; chlorine; discharges (electric); plasma devices; plasma simulation; Cl2; Cl2 chemistry; Cl2 plasma discharge; high-density plasma processing tools; inductively coupled plasma reactor; ion counter streaming; ion flux; modeling; plasma potential; simulation; two-dimensional time-dependent fluid model; Coupling circuits; Etching; Inductors; Plasma applications; Plasma chemistry; Plasma devices; Plasma materials processing; Plasma simulation; Poisson equations; Steady-state;
Journal_Title :
Plasma Science, IEEE Transactions on