DocumentCode
860489
Title
Ion density and temperature distributions in an inductively coupled high-plasma density reactor
Author
Lymberopoulos, Dimitris P. ; Wise, Richard S. ; Economou, Demetre J. ; Bartel, Timothy J.
Author_Institution
Dept. of Chem. Eng., Houston Univ., TX, USA
Volume
24
Issue
1
fYear
1996
fDate
2/1/1996 12:00:00 AM
Firstpage
129
Lastpage
130
Abstract
In a low-pressure plasma, the ion temperature Ti is comparable to the gas temperature Tg in regions of weak electric fields, but Ti can be more than an order of magnitude higher than Tg near the plasma sheath
Keywords
ion density; plasma density; plasma devices; plasma diagnostics; plasma sheaths; plasma temperature; temperature; temperature distribution; inductively coupled high-plasma density reactor; ion density; ion temperature; low-pressure plasma; plasma sheath; weak electric fields; Coils; Inductors; Laboratories; Plasma applications; Plasma chemistry; Plasma density; Plasma materials processing; Plasma sheaths; Plasma temperature; Temperature distribution;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.491746
Filename
491746
Link To Document