• DocumentCode
    860726
  • Title

    Performance degradation of GaN field-effect transistors due to thermal boundary resistance at GaN/substrate interface

  • Author

    Turin, V.O. ; Balandin, A.A.

  • Author_Institution
    Dept. of Electr. Eng., Univ. of California, Riverside, CA, USA
  • Volume
    40
  • Issue
    1
  • fYear
    2004
  • Firstpage
    81
  • Lastpage
    83
  • Abstract
    The authors investigate the effect of the thermal boundary resistance between the GaN layer and the substrate on the current-voltage characteristics of GaN MESFETs. Using material specific models for carrier drift-diffusion and thermal conductivity the authors determine the dependence of the breakdown voltage on thermal boundary resistance. The mechanism of the thermal breakdown in GaN transistors is also discussed. Obtained results can be used for structure optimisation of GaN-based transistors.
  • Keywords
    III-V semiconductors; avalanche breakdown; gallium compounds; negative resistance; power MESFET; semiconductor device breakdown; semiconductor device models; thermal resistance; wide band gap semiconductors; GaN; MESFET; avalanche breakdown; breakdown voltage; carrier drift-diffusion; current voltage characteristics; diffuse mismatch model; gate breakdown; material specific models; negative differential resistance; performance degradation; power transistors; structure optimisation; thermal boundary resistance; thermal conductivity;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:20040071
  • Filename
    1260691