DocumentCode
860726
Title
Performance degradation of GaN field-effect transistors due to thermal boundary resistance at GaN/substrate interface
Author
Turin, V.O. ; Balandin, A.A.
Author_Institution
Dept. of Electr. Eng., Univ. of California, Riverside, CA, USA
Volume
40
Issue
1
fYear
2004
Firstpage
81
Lastpage
83
Abstract
The authors investigate the effect of the thermal boundary resistance between the GaN layer and the substrate on the current-voltage characteristics of GaN MESFETs. Using material specific models for carrier drift-diffusion and thermal conductivity the authors determine the dependence of the breakdown voltage on thermal boundary resistance. The mechanism of the thermal breakdown in GaN transistors is also discussed. Obtained results can be used for structure optimisation of GaN-based transistors.
Keywords
III-V semiconductors; avalanche breakdown; gallium compounds; negative resistance; power MESFET; semiconductor device breakdown; semiconductor device models; thermal resistance; wide band gap semiconductors; GaN; MESFET; avalanche breakdown; breakdown voltage; carrier drift-diffusion; current voltage characteristics; diffuse mismatch model; gate breakdown; material specific models; negative differential resistance; performance degradation; power transistors; structure optimisation; thermal boundary resistance; thermal conductivity;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:20040071
Filename
1260691
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