DocumentCode :
860726
Title :
Performance degradation of GaN field-effect transistors due to thermal boundary resistance at GaN/substrate interface
Author :
Turin, V.O. ; Balandin, A.A.
Author_Institution :
Dept. of Electr. Eng., Univ. of California, Riverside, CA, USA
Volume :
40
Issue :
1
fYear :
2004
Firstpage :
81
Lastpage :
83
Abstract :
The authors investigate the effect of the thermal boundary resistance between the GaN layer and the substrate on the current-voltage characteristics of GaN MESFETs. Using material specific models for carrier drift-diffusion and thermal conductivity the authors determine the dependence of the breakdown voltage on thermal boundary resistance. The mechanism of the thermal breakdown in GaN transistors is also discussed. Obtained results can be used for structure optimisation of GaN-based transistors.
Keywords :
III-V semiconductors; avalanche breakdown; gallium compounds; negative resistance; power MESFET; semiconductor device breakdown; semiconductor device models; thermal resistance; wide band gap semiconductors; GaN; MESFET; avalanche breakdown; breakdown voltage; carrier drift-diffusion; current voltage characteristics; diffuse mismatch model; gate breakdown; material specific models; negative differential resistance; performance degradation; power transistors; structure optimisation; thermal boundary resistance; thermal conductivity;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:20040071
Filename :
1260691
Link To Document :
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