Injection control of a multipass amplification of a discharge excited XeF (C to A) laser

Author

Voges, H. ; Marowsky, G.

Author_Institution

Max-Planck-Inst. fur Biophys. Chem., Gottingen, West Germany

Volume

24

Issue

5

fYear

1988

fDate

5/1/1988 12:00:00 AM

Firstpage

827

Lastpage

832

Abstract

The laser performance and kinetic properties of the broadband C to A transition of the XeF*-exciplex have been studied under discharge excitation. With a pulsed dye laser as the injection source, amplified output pulses with an energy of up to 4 mJ have been obtained in the wavelength range from 450 to 520 nm. Injection of a well-defined seed pulse in an unstable confocal cavity has been developed into a useful technique for identification of subtle kinetic details of the complicated lasing process in XeF*, such as the role of the competitive narrow-band B to X transition or the influence of the various buffer gases.<>

Keywords

excimer lasers; laser beams; laser transitions; xenon compounds; 4 mJ; 450 to 520 nm; XeF; broadband C to A transition; buffer gases; confocal cavity; discharge excitation; injection source; multipass amplification; narrow-band B to X transition; pulsed dye laser; well-defined seed pulse; Laser excitation; Laser modes; Laser transitions; Laser tuning; Mirrors; Optical buffering; Optical control; Optical pulses; Optical resonators; Stimulated emission;

fLanguage

English

Journal_Title

Quantum Electronics, IEEE Journal of

Publisher

ieee

ISSN

0018-9197

Type

jour

DOI

10.1109/3.199

Filename

199