Title :
Fabrication techniques and characteristics of Al-SiO2 laminated optical polarizers
Author :
Sato, Takashi ; Baba, Kazutaka ; Hirozawa, Toru ; Shiraishi, Kazuo ; Kawakami, Shojiro
Author_Institution :
Res. Inst. of Electr. Commun., Tohoku Univ., Sendai, Japan
fDate :
1/1/1993 12:00:00 AM
Abstract :
Techniques for fabricating laminated polarizers (LAMIPOLs), which consist of alternating laminated layers of aluminum and silica, for the wavelength region λ>1 μm, are investigated. The oxidation of Al films is prevented by a suitable choice of deposition conditions. The surfaces of SiO2 films are smoothed by bias sputtering. A 10 μm thick LAMIPOL was obtained having an insertion loss of 0.15 dB and an extinction ratio of greater than 60 dB at the wavelength of 1.3 μm. These characteristics can be estimated from the attenuated constants of the fundamental modes even when higher modes are considered
Keywords :
aluminium; integrated optics; laminates; optical films; optical polarisers; optical workshop techniques; silicon compounds; sputter deposition; 1.3 micron; 60 dB; Al films; Al-SiO2 laminated optical polarizers; LAMIPOL; SiO2 films; alternating laminated layers; attenuated constants; bias sputtering; extinction ratio; fabrication techniques; fundamental modes; insertion; integrated optical circuits; oxidation; surfaces; wavelength region; Dielectrics; Insertion loss; Optical attenuators; Optical device fabrication; Optical films; Optical interferometry; Optical losses; Optical polarization; Optical sensors; Tellurium;
Journal_Title :
Quantum Electronics, IEEE Journal of
