• DocumentCode
    863178
  • Title

    Two-dimensional GaAs photonic switch array with direct gain and high contrast

  • Author

    Mori, Yoshihiro

  • Author_Institution
    Matsushita Electric Ind. Co. Ltd., Osaka, Japan
  • Volume
    29
  • Issue
    2
  • fYear
    1993
  • fDate
    2/1/1993 12:00:00 AM
  • Firstpage
    396
  • Lastpage
    402
  • Abstract
    The fabrication and design of a 4×4 surface-normal reflection photonic switch array, with an operating principle based on the change of the gain coefficient in GaAs, is described. A 3-μm-thick GaAs active layer and carrier confinement layers are sandwiched between a semiconductor multilayer reflector and an antireflection window. The beryllium ion implantation technique is used to make a narrow current path to reduce the operation current. Each photonic switch independently realizes direct amplification and absorption of the optical signal. It features an optical gain of 4 dB and a contrast of 9.6 dB, for an applied voltage of 2.2 V. The array has a simple planar structure
  • Keywords
    III-V semiconductors; electro-optical devices; gallium arsenide; integrated optics; optical switches; semiconductor switches; 2.2 V; 2D array; 3 micron; 4 dB; 4×4 surface-normal reflection photonic switch array; Be ion implantation; GaAs active layer; GaAs:Be; III-V semiconductor; antireflection window; carrier confinement layers; design; direct amplification; direct gain; fabrication; gain coefficient; high contrast; integration; modulator; narrow current path; operation current; optical gain; optical signal absorption; semiconductor multilayer reflector; simple planar structure; Carrier confinement; Fabrication; Gallium arsenide; Ion implantation; Nonhomogeneous media; Optical arrays; Optical reflection; Particle beam optics; Stimulated emission; Switches;
  • fLanguage
    English
  • Journal_Title
    Quantum Electronics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9197
  • Type

    jour

  • DOI
    10.1109/3.199294
  • Filename
    199294