Title :
Generalized mobility law for drain current modeling in Si MOS transistors from liquid helium to room temperatures
Author :
Emrani, Ayoub ; Balestra, Francis ; Ghibaudo, Gérard
Author_Institution :
Lab. de Phys. des Compsants a Semicond., URA CNRS, Grenoble, France
fDate :
3/1/1993 12:00:00 AM
Abstract :
A generalized mobility law for drain current modeling in Si MOSFETs operated in the linear region which is valid between room and liquid helium temperatures, is presented. It is based on the existence of a power-law parameter that is a unique value of n for each temperature and that allows the linearization of an appropriate function of gate voltage at sufficiently strong inversion, depending on the drain current and the transconductance of the device. It is demonstrated that a unique value of n can be found for each temperature with a very high precision. This model has been successfully applied to a number of n- and p-channel MOS transistors, and can be used to obtain an accurate extraction of the main device parameters and, therefore, a precise modeling of the transfer characteristics in the whole range of temperature for strong inversion operation
Keywords :
elemental semiconductors; insulated gate field effect transistors; semiconductor device models; silicon; 4.2 to 300 K; MOSFETs; Si transistors; accurate extraction; cryogenic operation; drain current modeling; gate voltage; generalized mobility law; linear region; linearization; liquid He temperature; n-channel MOS transistors; p-channel MOS transistors; power-law parameter; precise modeling; range of temperature; room temperature; semiconductors; strong inversion; transconductance; transfer characteristics; Attenuation; Capacitance; Cryogenics; Helium; MOSFET circuits; Parameter extraction; Temperature distribution; Threshold voltage; Transconductance;
Journal_Title :
Electron Devices, IEEE Transactions on