DocumentCode
864683
Title
Cut-Through Metal Slit Array as an Anisotropic Metamaterial Film
Author
Shin, Jonghwa ; Shen, Jung-Tsung ; Catrysse, Peter B. ; Fan, Shanhui
Author_Institution
Edward L. Ginzton Lab., Stanford Univ., CA
Volume
12
Issue
6
fYear
2006
Firstpage
1116
Lastpage
1122
Abstract
It has been shown that a metal film with a one-dimensional array of subwavelength cut-through slits can be accurately modeled as an anisotropic and uniform metamaterial film with nondispersive electric permittivity [epsimacr] and magnetic permeability [mumacr] tensors. This model has an interesting scaling property: The values for the thickness Lmacr can be chosen at arbitrarily, provided that [epsimacr] and [mumacr] are scaled accordingly. The analytical expressions of the corrections due to near fields have also been given. This framework provides an intuitive and precise model for the understanding of the metal slit arrays in the subwavelength regime
Keywords
anisotropic media; magnetic permeability; metallic thin films; metamaterials; optical arrays; optical films; optical materials; permittivity; anisotropic metamaterial film; magnetic permeability; metal slit array; nondispersive electric permittivity; Anisotropic magnetoresistance; Magnetic analysis; Magnetic films; Magnetic materials; Metamaterials; Optical materials; Permeability; Permittivity; Resonance; Tensile stress; Anisotropic material; metal slit; optical metamaterial; subwavelength resonance;
fLanguage
English
Journal_Title
Selected Topics in Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
1077-260X
Type
jour
DOI
10.1109/JSTQE.2006.879577
Filename
4032696
Link To Document