• DocumentCode
    864683
  • Title

    Cut-Through Metal Slit Array as an Anisotropic Metamaterial Film

  • Author

    Shin, Jonghwa ; Shen, Jung-Tsung ; Catrysse, Peter B. ; Fan, Shanhui

  • Author_Institution
    Edward L. Ginzton Lab., Stanford Univ., CA
  • Volume
    12
  • Issue
    6
  • fYear
    2006
  • Firstpage
    1116
  • Lastpage
    1122
  • Abstract
    It has been shown that a metal film with a one-dimensional array of subwavelength cut-through slits can be accurately modeled as an anisotropic and uniform metamaterial film with nondispersive electric permittivity [epsimacr] and magnetic permeability [mumacr] tensors. This model has an interesting scaling property: The values for the thickness Lmacr can be chosen at arbitrarily, provided that [epsimacr] and [mumacr] are scaled accordingly. The analytical expressions of the corrections due to near fields have also been given. This framework provides an intuitive and precise model for the understanding of the metal slit arrays in the subwavelength regime
  • Keywords
    anisotropic media; magnetic permeability; metallic thin films; metamaterials; optical arrays; optical films; optical materials; permittivity; anisotropic metamaterial film; magnetic permeability; metal slit array; nondispersive electric permittivity; Anisotropic magnetoresistance; Magnetic analysis; Magnetic films; Magnetic materials; Metamaterials; Optical materials; Permeability; Permittivity; Resonance; Tensile stress; Anisotropic material; metal slit; optical metamaterial; subwavelength resonance;
  • fLanguage
    English
  • Journal_Title
    Selected Topics in Quantum Electronics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    1077-260X
  • Type

    jour

  • DOI
    10.1109/JSTQE.2006.879577
  • Filename
    4032696