DocumentCode :
864683
Title :
Cut-Through Metal Slit Array as an Anisotropic Metamaterial Film
Author :
Shin, Jonghwa ; Shen, Jung-Tsung ; Catrysse, Peter B. ; Fan, Shanhui
Author_Institution :
Edward L. Ginzton Lab., Stanford Univ., CA
Volume :
12
Issue :
6
fYear :
2006
Firstpage :
1116
Lastpage :
1122
Abstract :
It has been shown that a metal film with a one-dimensional array of subwavelength cut-through slits can be accurately modeled as an anisotropic and uniform metamaterial film with nondispersive electric permittivity [epsimacr] and magnetic permeability [mumacr] tensors. This model has an interesting scaling property: The values for the thickness Lmacr can be chosen at arbitrarily, provided that [epsimacr] and [mumacr] are scaled accordingly. The analytical expressions of the corrections due to near fields have also been given. This framework provides an intuitive and precise model for the understanding of the metal slit arrays in the subwavelength regime
Keywords :
anisotropic media; magnetic permeability; metallic thin films; metamaterials; optical arrays; optical films; optical materials; permittivity; anisotropic metamaterial film; magnetic permeability; metal slit array; nondispersive electric permittivity; Anisotropic magnetoresistance; Magnetic analysis; Magnetic films; Magnetic materials; Metamaterials; Optical materials; Permeability; Permittivity; Resonance; Tensile stress; Anisotropic material; metal slit; optical metamaterial; subwavelength resonance;
fLanguage :
English
Journal_Title :
Selected Topics in Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
1077-260X
Type :
jour
DOI :
10.1109/JSTQE.2006.879577
Filename :
4032696
Link To Document :
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