DocumentCode :
864859
Title :
Investigation of interfaces with analytical tools
Author :
Dias, Rajen
Author_Institution :
Assembly Technol. Dev., Intel Corp., Chandler, AZ, USA
Volume :
3
Issue :
4
fYear :
2003
Firstpage :
179
Lastpage :
183
Abstract :
This paper focuses on advancements in three areas of analyzing interfaces, namely, acoustic microscopy for detecting damage to closely spaced interfaces, thermal imaging to detect damage and degradation of thermal interface materials and laser spallation, a relatively new concept to understand the strength of interfaces. Acoustic microscopy has been used widely in the semiconductor assembly and package area to detect delamination, cracks and voids in the package, but the resolution in the axial direction has always been a limitation of the technique. Recent advancements in acoustic waveform analysis has now allowed for detection and resolution of closely spaced interfaces such as layers within the die. Thermal imaging using infrared (IR) thermography has long been used for detection of hot spots in the die or package. With recent advancements in very high-speed IR cameras, improved pixel resolution, and sophisticated software programming, the kinetics of heat flow can now be imaged and analyzed to reveal damage or degradation of interfaces that are critical to heat transfer. The technique has been demonstrated to be useful to understand defects and degradation of thermal interface materials used to conduct heat away from the device. Laser spallation is a method that uses a short duration laser pulse to cause fracture at the weakest interface and has the ability to measure the adhesion strength of the interface. The advantage of this technique is that it can be used for fully processed die or wafers and even on packaged devices. The technique has been used to understand interfaces in devices with copper metallization and low-k dielectrics.
Keywords :
acoustic microscopy; crack detection; deformation; delamination; interface phenomena; semiconductor device packaging; semiconductor epitaxial layers; semiconductor junctions; thermomechanical treatment; acoustic microscopy; acoustic waveform analysis; adhesion strength; analytical tools; axial direction; closely spaced interfaces; copper metallization; crack detection; damage detection; degradation; delamination detection; heat flow kinetics; heat transfer; high-speed IR cameras; hot spot detection; infrared thermography; interface analysis; interface fracture; interface strength; laser spallation; low-k dielectrics; pixel resolution; processed die; processed wafer; semiconductor assembly; semiconductor packaging; software programming; thermal imaging; thermal interface materials; void detection; Acoustic imaging; Acoustic signal detection; Heat transfer; Image analysis; Infrared detectors; Microscopy; Optical materials; Pulse measurements; Semiconductor device packaging; Thermal degradation;
fLanguage :
English
Journal_Title :
Device and Materials Reliability, IEEE Transactions on
Publisher :
ieee
ISSN :
1530-4388
Type :
jour
DOI :
10.1109/TDMR.2003.821668
Filename :
1261732
Link To Document :
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