Title :
Micromachined metal thin-film pressure sensor suitable for batch process
Author_Institution :
Sch. Inf. Syst. Eng., Dongseo Univ., Pusan, South Korea
fDate :
10/24/2002 12:00:00 AM
Abstract :
Description of the fabrication and characteristics of a micromachined metal thin-film pressure sensor for working at high temperatures is presented. The proposed pressure sensor consists of a Cr thin-film, patterned on a Wheatstone bridge configuration, sputter-deposited onto thermally oxidised Si membranes with an Al interconnection layer. This sensor has the advantages of high sensitivity, high temperature operation and is suitable for batch process.
Keywords :
batch processing (industrial); bridge instruments; chromium; high-temperature techniques; metallic thin films; micromachining; microsensors; pressure sensors; sputtered coatings; Al; Al interconnection layer; Cr; Cr thin film; Si; Wheatstone bridge; batch process; fabrication process; high temperature operation; micromachined metal thin film pressure sensor; sensitivity; sputter deposition; thermally oxidised Si membrane;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:20020933
