Magnetism and crystal structure of Fe/Si multilayered films prepared by ion beam sputtering

Fe/Si multilayered films have been prepared by ion-beam sputtering. The dependence of their crystal structure and magnetic properties on the individual layer thicknesses has been investigated. The annealing effects for those films have also been examined. The films with Fe and Si layer thickness of more than 85 Å clearly exhibited multilayered microstructure. H_c of the films with δ_Fe of 10 Å had a minimum value of 1.5 Oe at δ_Si of about 4 Å. For the films with δ_Si of 20 Å, H_c had a relatively high value of about 50 Oe; it reached its minimum value of about 2 Oe at δ_Si of about 40 Å after annealing at 300°C for 1 h