Title :
Magnetic properties of Fe-N/Fe multilayered films deposited by an opposed targets sputtering
Author :
Hoshi, Y. ; Naoe, M.
Author_Institution :
Tokyo Inst. of Polytech., Kanagawa, Japan
fDate :
9/1/1990 12:00:00 AM
Abstract :
Fe-N/Fe multilayer films have been deposited by an opposed-target sputtering apparatus and their magnetic properties were investigated. Coercive force, Hc, of the Fe-N/Fe multilayer film takes a minimum value at a proper nitrogen content and decreases as the length of the layer period dlayer increases. This decrease in Hc is mainly due to the decrease in perpendicular magnetic anisotropy of the film. The film with a dlayer of 1480 Å has an Hc of 1.5 Oe and a saturation magnetization of 1600 emu/cm3. Annealing at a temperature above 200°C leads to the crystallization of the α-Fe and γ´-Fe4N in the film. Diffusion of the nitrogen atoms from the Fe-N layer to the Fe layer becomes significant at a temperature above 400°C, and the layered structure in the film is removed by annealing at a temperature above 450°C. The Hc of the film takes a value in the range from 1 to 5 Oe irrespective of dlayer and nitrogen gas flow rate if the film is annealed at a temperature above 350°C
Keywords :
annealing; coercive force; crystallisation; iron; iron compounds; magnetic anisotropy; magnetic thin films; magnetisation; sputtered coatings; α-Fe; γ´-Fe4N; 200 to 450 degC; FeN-Fe; N content; N diffusion; annealing; coercive force; crystallization; gas flow rate; layer period; layered structure; magnetic properties; multilayered films; opposed targets sputtering; perpendicular magnetic anisotropy; saturation magnetization; Annealing; Coercive force; Iron; Magnetic films; Magnetic multilayers; Magnetic properties; Nitrogen; Perpendicular magnetic anisotropy; Sputtering; Temperature;
Journal_Title :
Magnetics, IEEE Transactions on