• DocumentCode
    865751
  • Title

    Carbon cathode spot plasma flux distributions in low pressures of hydrogen: some evidence for the C++H2→CH++H reaction

  • Author

    Meunier, Jean-Luc ; De Azevedo, Mario Douyon

  • Author_Institution
    Dept. of Chem. Eng., McGill Univ., Montreal, Que., Canada
  • Volume
    20
  • Issue
    6
  • fYear
    1992
  • fDate
    12/1/1992 12:00:00 AM
  • Firstpage
    1053
  • Lastpage
    1059
  • Abstract
    Measurements of the wall current collected from the expanding cathodic arc plasma are reported as a function of angle to cathode plane normal, with hydrogen gas pressure in the arc chamber varying between 10 -4 torr and 10 torr and distance R to the cathode varying between 10 and 80 mm. The angular distribution of the collected current is not seen to be affected by the gas pressure in the chamber. This flux decreases with distance to the cathode as R-(1.4) in vacuum and R-4 in the 1-10 torr pressure domain. Flux intensity evaluated as a function of NR, where N is the number density of hydrogen in the chamber, leads to an evaluation of an effective collision cross section, σe, of 0.2×10-16 cm2 for the C+-ion/H2 molecule interaction. This value can be attributed to the reaction C++H2→CH+ +H and agrees with a velocity of the C+ ions following a shock wave interaction model
  • Keywords
    arcs (electric); carbon; cathodes; chemical exchanges; hydrogen neutral molecules; ion-molecule reactions; plasma collision processes; plasma diagnostics; plasma probes; plasma transport processes; positive ions; 10E-4 to 10 torr; C+; C++H2; C+-H2; H2; angular distribution; cathode spot plasma flux distributions; effective collision cross section; expanding cathodic arc plasma; flux intensity; gas pressure; low pressure discharges; shock wave interaction model; wall current; Cathodes; Copper; Electrodes; Hydrogen; Ion beams; Plasma density; Plasma materials processing; Plasma properties; Plasma waves; Shock waves;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.199572
  • Filename
    199572