• DocumentCode
    866835
  • Title

    In Situ Studies of Emission Characteristics of the DC Thermal Arc Plasma Column During Synthesis of Nano-AlN Particles

  • Author

    Banerjee, Indrani ; Joshi, N.K. ; Sahasrabudhe, S.N. ; Karmakar, Soumen ; Kulkarni, Naveen V. ; Ghorui, S. ; Tak, Atul K. ; Murthy, Shri P S S ; Bhoraskar, S.V. ; Das, A.K.

  • Author_Institution
    Dept. of Phys., Univ. of Pune
  • Volume
    34
  • Issue
    6
  • fYear
    2006
  • Firstpage
    2611
  • Lastpage
    2617
  • Abstract
    The growth process of nanoparticles and nanowires of AlN by thermal-plasma-assisted gas phase condensation reaction has been investigated by optical emission spectroscopy. The concentrations of the reacting precursors in the plasma have been correlated to the crystalline phases of nanoparticles of AlN found from X-ray diffraction analysis. The size and morphology of the nanoparticles have been studied by transmission electron microscope investigations of as-synthesized powder at a set of reactor parameters, which included arc current, reactor pressure, and standoffs of the arc column. An attempt has been made to correlate the growth of AlN to that of the precursor density present in the plasma reaction zone
  • Keywords
    III-V semiconductors; X-ray diffraction; aluminium compounds; arcs (electric); nanoparticles; nanotechnology; nanowires; plasma density; plasma diagnostics; plasma materials processing; plasma transport processes; semiconductor growth; transmission electron microscopy; wide band gap semiconductors; AlN; DC thermal arc plasma column; X-ray diffraction; arc current; crystalline phases; nanoparticles; nanowires; optical emission spectroscopy; reactor pressure; thermal-plasma-assisted gas phase condensation reaction; transmission electron microscope; Crystallization; Electron optics; Inductors; Nanoparticles; Nanowires; Optical diffraction; Plasma x-ray sources; Spectroscopy; Stimulated emission; X-ray diffraction; Nanoparticle synthesis; optical emission spectroscopy (OES); plasma arc devices;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2006.886059
  • Filename
    4032873