Title :
An Equivalent Circuit Modeling of an Equispaced Metallic Nanoparticles (MNPs) Plasmon Wire
Author :
Song, Kyungjun ; Mazumder, Pinaki
Author_Institution :
Dept. of Mech. Eng., Univ. of Michigan, Ann Arbor, MI
fDate :
5/1/2009 12:00:00 AM
Abstract :
Based on the electric dipole moment (EDM) model of free oscillating electrons inside a single metallic nanoparticle (MNP), a comprehensive methodology is presented in the paper for calculating the equivalent circuit elements associated with an MNP. To find out the passive circuit elements for the MNP, the electromagnetic (EM) power flows are calculated by deriving the relaxation damping, radiation outflow, host matrix EM coupling, and applied signal interaction. The law of conservation of energy is then used to compute the extended oscillatory equation motion of a spherical MNP. The resonant behavior of a single MNP is represented by a lumped resonant circuit model, where the circuit parameters RLC are derived from the equation of motion of the EDM and EM near-field energy outside the MNP. Finally, equivalent circuit of a linearly equispaced MNPs plasmon wire is modeled as a voltage-controlled voltage source by using the nearest surface plasmon interactions.
Keywords :
RLC circuits; active networks; circuit oscillations; damping; electric moments; electromagnetic coupling; energy conservation; equivalent circuits; lumped parameter networks; nanoparticles; passive networks; surface plasmon resonance; RLC circuit parameters; applied signal interaction; electric dipole moment model; electromagnetic coupling; electromagnetic power flows; energy conservation law; equispaced metallic nanoparticles; equivalent circuit modeling; free oscillating electrons; lumped resonant circuit model; oscillatory equation motion; passive circuit elements; plasmon wire; radiation outflow; relaxation damping; single metallic nanoparticle; surface plasmon interactions; voltage-controlled voltage source; Full-width at half-maximum (FWHM); lumped resonant circuit model; optical interconnect; radiation damping; relaxation damping; surface plasmon (SP); surrounding matrix damping; voltage-controlled voltage source (VCVS);
Journal_Title :
Nanotechnology, IEEE Transactions on
DOI :
10.1109/TNANO.2008.2005493