DocumentCode
868023
Title
Phase-shifting masks gain an edge
Author
Lin, B.J.
Volume
9
Issue
2
fYear
1993
fDate
3/1/1993 12:00:00 AM
Firstpage
28
Lastpage
35
Abstract
The potential, working principles, and approaches in phase shifting masks for optical lithography are discussed. The tradeoffs of each approach, and fabrication, inspection, repair, and tolerances are considered. It is feasible to use the phase shifting technology to improve optical lithography to 0.18- mu m feature size with k/sub 1/=0.35, lambda =248 nm, and NA=0.5. Further resolution improvements are still possible, but much development is required for making phase shifting masks a manufacturing reality.<>
Keywords
masks; photolithography; 0.18 micron; fabrication; inspection; optical lithography; phase shifting masks; repair; resolution improvements; tolerances; Focusing; Lithography; Optical films; Optical imaging; Optical refraction; Optical sensors; Optical variables control; Refractive index; Resists; Shape;
fLanguage
English
Journal_Title
Circuits and Devices Magazine, IEEE
Publisher
ieee
ISSN
8755-3996
Type
jour
DOI
10.1109/101.200850
Filename
200850
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