DocumentCode
868419
Title
Fabrication of integrated metallic MEMS devices
Author
Yalçinkaya, A.D. ; Ravnkilde, J.T. ; Hansen, O.
Author_Institution
Nat. Micro & Nanotechnology Res. Center, Lyngby, Denmark
Volume
38
Issue
24
fYear
2002
fDate
11/21/2002 12:00:00 AM
Firstpage
1526
Lastpage
1527
Abstract
A simple and complementary metal oxide semiconductor (CMOS) compatible fabrication technique for microelectromechanical (MEMS) devices is presented. The fabrication technology makes use of electroplated metal layers. Among the fabricated devices, high quality factor microresonators are characterised with respect to the quality factor.
Keywords
Q-factor; electroplated coatings; micromechanical devices; micromechanical resonators; CMOS wafer; electroplated metal layer; fabrication technology; integrated metallic MEMS device; microresonator; quality factor;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:20021032
Filename
1106094
Link To Document