Title :
Superconducting flux flow transistors with submicrometer structures
Author :
Kusunoki, M. ; Akaike, H. ; Fujimaki, A. ; Hayakawa, H.
Author_Institution :
Dept. of Electron., Nagoya Univ., Japan
fDate :
6/1/1995 12:00:00 AM
Abstract :
A miniaturization of high critical temperature (T/sub c/) superconducting flux flow transistor (SFFT) was studied. The weak link width in the direction of the vortex flow was varied from 5 /spl mu/m to 10 /spl mu/m. The weak link length in the direction of bias current flow was fixed to 5 /spl mu/m. An increase in the gain was observed as the weak link width decreased. A control line was placed close to the weak link at a distance of 0.5 /spl mu/m to compensate for a decrease of magnetic sensitivity due to the miniaturization. We also improved the characteristics of the SFFT by forming a corrugated structure, which is named corrugation flux flow transistor (CFFT). A submicron patterning of YBa/sub 2/Cu/sub 3/O/sub y/ (YBCO) thin film was performed using focused ion beam lithography. Furthermore, we demonstrated a micro flux flow transistor (MFFT) consisting of a single bridge. The MFFT also operated as well as the CFFT.<>
Keywords :
barium compounds; electron device manufacture; flux flow; focused ion beam technology; high-temperature superconductors; ion beam lithography; superconducting transistors; yttrium compounds; YBCO thin film; YBa/sub 2/Cu/sub 3/O; bias current flow; control line; corrugation flux flow transistor; focused ion beam lithography; gain; high temperature superconductor; magnetic sensitivity; micro flux flow transistor; miniaturization; submicrometer structures; superconducting flux flow transistors; vortex flow; weak link; Bridges; Controllability; Ion beams; Lithography; Niobium; Reproducibility of results; Superconducting microwave devices; Temperature; Transistors; Yttrium barium copper oxide;
Journal_Title :
Applied Superconductivity, IEEE Transactions on
