DocumentCode :
870175
Title :
Radiation Dose Effects in Trigate SOI MOS Transistors
Author :
Colinge, J.P. ; Orozco, A. ; Rudee, J. ; Xiong, Weize ; Cleavelin, C. Rinn ; Schulz, T. ; Schrufer, K. ; Knoblinger, G. ; Patruno, P.
Author_Institution :
Dept. of Electr. & Comput. Eng., California Univ., Davis, CA
Volume :
53
Issue :
6
fYear :
2006
Firstpage :
3237
Lastpage :
3241
Abstract :
N-channel trigate SOI MOSFETs have been irradiated with 60 Co gamma rays at doses up to 6 Mrad(SiO2). The threshold voltage shift at 6 Mrad is less than 10 mV in transistors with a gate length of 0.3 mum. At 6 Mrad(SiO2), the current drive reduction in the same devices is 10% if VG=0 V during irradiation and 20% if VG=1 V during the irradiation. The generation of positive charges in the BOX increases the electron concentration at the bottom interface of the silicon fins. Inversion electrons at the bottom interface have a higher mobility than the electrons at the (110)-oriented fin sidewalls. As a result, an increase of transconductance with dose is observed at moderate doses [<1 Mrad(SiO2)]. At higher doses, the usual mobility degradation caused by interface trap generation is observed
Keywords :
MOSFET; electron mobility; gamma-ray effects; silicon-on-insulator; (110)-oriented fin sidewalls; 60Co gamma rays; N-channel trigate SOI MOS transistors; bottom interface; electron concentration; interface trap generation; inversion electrons; mobility degradation; semiconductor device radiation dose effects; silicon fins; silicon on insulator technology; threshold voltage shift; transconductance; trigate SOI MOSFET; Degradation; Electron mobility; Electron traps; Gamma rays; MOSFETs; Radiation hardening; Semiconductor films; Silicon on insulator technology; Threshold voltage; Transconductance; MOSFETs; semiconductor device radiation effects; silicon on insulator technology;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.2006.885841
Filename :
4033341
Link To Document :
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