DocumentCode :
870890
Title :
An online test microstructure for thermal conductivity of surface-micromachined polysilicon thin films
Author :
Xu, Gao-Bin ; Huang, Qing-An
Author_Institution :
Key Lab. of MEMS, Southeast Univ., Nanjing, China
Volume :
6
Issue :
2
fYear :
2006
fDate :
4/1/2006 12:00:00 AM
Firstpage :
428
Lastpage :
433
Abstract :
An online test structure for measuring the thermal conductivity of surface micromachined polysilicon thin films is presented. In the structure, a pair of microstructures, i.e., a reference structure and a test structure, are used. The surface micromachined structures are heated electrically. Heat dissipation by convection, radiation, and heat transfer through the air gap and into the substrate is considered in an electrothermal model. The model is confirmed by ANSYS Software. In experiments, current-voltage measurements are only required, and all measurements can be carried out in free air. The surface-micromachined and p-doped polysilicon thin films with a sheet resistance 116.25 Ω/sq. are measured to have a thermal conductivity 28.7 W/mK at 300 K.
Keywords :
micromachining; micromechanical devices; silicon; thermal conductivity measurement; thin films; 300 K; electric heating; electrothermal model; heat dissipation; online test microstructure; p-doped polysilicon thin films; surface micromachining; thermal conductivity measurement; Conductivity measurement; Current measurement; Electrical resistance measurement; Heat transfer; Microstructure; Resistance heating; Surface resistance; Testing; Thermal conductivity; Transistors; Online test; polysilicon thin films; surface-micromachining process; thermal conductivity;
fLanguage :
English
Journal_Title :
Sensors Journal, IEEE
Publisher :
ieee
ISSN :
1530-437X
Type :
jour
DOI :
10.1109/JSEN.2006.870169
Filename :
1608086
Link To Document :
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