DocumentCode :
871250
Title :
A Dual-Capture Wide Dynamic Range CMOS Image Sensor Using Floating-Diffusion Capacitor
Author :
Kim, Dongsoo ; Chae, Youngcheol ; Cho, Jihyun ; Han, Gunhee
Author_Institution :
Dept. of Electr. & Electron. Eng., Yonsei Univ., Seoul
Volume :
55
Issue :
10
fYear :
2008
Firstpage :
2590
Lastpage :
2594
Abstract :
A dual-capture wide dynamic range CMOS image sensor using an in-pixel floating-diffusion (FD) storage capacitor is proposed. The proposed structure uses the FD as a storage capacitor. The potential of the FD node is read out using a floating-gate capacitor without a contact metallization of the FD node to reduce the leakage. The proposed sensor was fabricated using a 0.35-mum CMOS process. The chip includes 320 times 240 pixels whose pitch is 5.6 mum and whose fill factor is 36%. The measurement results show 100-dB dynamic range, and the leakage at the non-metalized FD is reduced to about one-third of that of the conventional FD with the contact metallization.
Keywords :
CMOS image sensors; capacitors; contact metallization; dual-capture; floating-diffusion storage capacitor; picture size 240 pixel; picture size 320 pixel; size 0.35 mum; wide dynamic range CMOS image sensor; CMOS image sensors; Capacitive sensors; Capacitors; Computational Intelligence Society; Dynamic range; Image sensors; Image storage; Metallization; Nonvolatile memory; Signal to noise ratio; CMOS image sensor (CIS); dual capture; non-metalized floating gate (FG); wide dynamic image sensor;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2008.2003023
Filename :
4631389
Link To Document :
بازگشت