• DocumentCode
    871604
  • Title

    Thin-film lateral bipolar transistor in silicon-on-sapphire structure

  • Author

    Zuleeg, R. ; Knoll, Peter

  • Author_Institution
    Hughes Aircraft Co., Applied Solid State Research Department, Newport Beach, USA
  • Volume
    3
  • Issue
    4
  • fYear
    1967
  • fDate
    4/1/1967 12:00:00 AM
  • Firstpage
    137
  • Lastpage
    139
  • Abstract
    Heteroepitaxial films of silicon-on-sapphire were used to fabricate lateral bipolar n-p-n transistors. The devices have a common-base direct-current amplification factor of 0.9 and a maximum frequency of oscillation of 2.4 GHz. As a result of the vertical p-n-junction arrangement, small junction areas are possible, e.g. 1×10¿6cm2, which yield depletion-layer capacitances of 0.02¿0.05 pF.
  • Keywords
    instrumentation; integrated circuits; transistors;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19670107
  • Filename
    4207167