DocumentCode :
871993
Title :
Charge Collection Measurements for Heavy Ions Incident on n- and p-Type Silicon
Author :
Oldham, T.R. ; McLean, F.B.
Author_Institution :
U.S. Army ERADCOM/Harry Diamond Laboratories Adelphi, Maryland 20783
Volume :
30
Issue :
6
fYear :
1983
Firstpage :
4493
Lastpage :
4500
Abstract :
We present the results of charge collection measurements for heavy ions incident on n- and p-type silicon for a range of doping densities and bias conditions. The total collected charge agrees reasonably well for most particles with the simple model we presented last year. However, the model begins to break down for very highly ionizing particles. The experiments also indicate that the collection time increases with ionization density, so that significant recovery of the struck junction may occur during the collection process. We also found that recombination is only a small effect; and the charge collection does not seem to depend strongly on angle of incidence, at least for the cases where we performed measurements. We discuss the implications of all these findings for circuits operating in a cosmic ray environment.
Keywords :
Alpha particles; Charge measurement; Circuits; Current measurement; Doping; Ionization; Performance evaluation; Plasma density; Semiconductor process modeling; Silicon;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1983.4333160
Filename :
4333160
Link To Document :
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