DocumentCode :
872176
Title :
Control of liquid flow distribution utilizing EHD conduction pumping mechanism
Author :
Feng, Yinshan ; Seyed-Yagoobi, Jamal
Author_Institution :
Foxconn/Foxflow Thermal Technol. Inc., Austin, TX, USA
Volume :
42
Issue :
2
fYear :
2006
Firstpage :
369
Lastpage :
377
Abstract :
A maldistribution of liquid flow in parallel evaporators may cause local hot areas, leading to dry-out of branch lines and resulting in a nonoptimum performance. The electrohydrodynamic (EHD) conduction pumping shows its potential as an active control method of the flow distribution. The EHD conduction pumping is associated with the heterocharge layers of finite thickness in the vicinity of the electrodes, which are based on the process of dissociation of the neutral electrolytic species and recombination of the generated ions. This paper presents the successful control of liquid flow distribution between two branch lines utilizing an EHD conduction pump at total mass flux levels of 100 and 200 kg/m2·s.
Keywords :
electrodes; electrohydrodynamics; flow control; pumps; EHD conduction pumping; active control method; branch lines; electrodes; electrohydrodynamic; heterocharge layers; ions recombination; liquid flow distribution control; neutral electrolytic species; parallel evaporators; Electrodes; Electrohydrodynamics; Fluid flow; Industry Applications Society; Maldistribution; Optical polarization; Permittivity; Pumps; Thermal management; Weight control; Electrohydrodynamic (EHD); flow control; liquid distribution; pumping;
fLanguage :
English
Journal_Title :
Industry Applications, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-9994
Type :
jour
DOI :
10.1109/TIA.2005.863909
Filename :
1608212
Link To Document :
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