DocumentCode :
873109
Title :
Performance and Applications of Room Temperature Silicon Passivated Ion-Implanted X-Ray Detectors
Author :
Burger, P. ; Lampert, M.O. ; Henck, R. ; Kemmer, J.
Author_Institution :
Enertec Schlumberger, Strasbourg Lingolsheim, France
Volume :
31
Issue :
1
fYear :
1984
Firstpage :
344
Lastpage :
347
Abstract :
Silicon detectors exhibiting reverse currents of less than 1 nA cm-2/100 ¿m at 20°C have been manufactured in a reproducible way using photo-engraving and ion-implantation techniques. For use as X-ray detectors only aluminium and epoxies are used for the mount in order to avoid any parasitic fluorescence. Typical energy resolution at 20°C is 1.3 keV at 10-20 keV for 10 mm2 active area detectors. The main contribution to the performance is the temperature stability. Applications developped are a system for X-ray fluorescence analysis of metal ores and a prototype for environmental monitoring using 16 multiplexed Si detectors with an overall resolution of 1.8 keV in the 10-20 KeV region for the total 400 mm2 area.
Keywords :
Aluminum; Energy resolution; Fluorescence; Manufacturing; Ores; Prototypes; Silicon; Stability; Temperature; X-ray detectors;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1984.4333273
Filename :
4333273
Link To Document :
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