• DocumentCode
    873109
  • Title

    Performance and Applications of Room Temperature Silicon Passivated Ion-Implanted X-Ray Detectors

  • Author

    Burger, P. ; Lampert, M.O. ; Henck, R. ; Kemmer, J.

  • Author_Institution
    Enertec Schlumberger, Strasbourg Lingolsheim, France
  • Volume
    31
  • Issue
    1
  • fYear
    1984
  • Firstpage
    344
  • Lastpage
    347
  • Abstract
    Silicon detectors exhibiting reverse currents of less than 1 nA cm-2/100 ¿m at 20°C have been manufactured in a reproducible way using photo-engraving and ion-implantation techniques. For use as X-ray detectors only aluminium and epoxies are used for the mount in order to avoid any parasitic fluorescence. Typical energy resolution at 20°C is 1.3 keV at 10-20 keV for 10 mm2 active area detectors. The main contribution to the performance is the temperature stability. Applications developped are a system for X-ray fluorescence analysis of metal ores and a prototype for environmental monitoring using 16 multiplexed Si detectors with an overall resolution of 1.8 keV in the 10-20 KeV region for the total 400 mm2 area.
  • Keywords
    Aluminum; Energy resolution; Fluorescence; Manufacturing; Ores; Prototypes; Silicon; Stability; Temperature; X-ray detectors;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1984.4333273
  • Filename
    4333273