DocumentCode :
874019
Title :
Production of very high electron density assisted by lasers
Author :
Girardeau-Montaut, J.P. ; Girardeau-Montaut, C. ; Dei-Cas, R.
Author_Institution :
Lab. des Interactions Laser-Mater., Univ. Claude Bernard, Lyon, France
Volume :
24
Issue :
6
fYear :
1989
fDate :
12/1/1989 12:00:00 AM
Firstpage :
1049
Lastpage :
1052
Abstract :
An analysis is presented of a new basic concept for very-high-electron-density emission from metal photocathodes conjugating the action of two lasers. The action of the first laser, a low-frequency (infrared or far-infrared), high-density source (>10 to 100 MW/cm2), is supported to lower the potential barrier and enhance the energy of conduction electrons at the surface of the material and increase significantly the effective photoelectric quantum yield. The second laser is a visible or ultraviolet laser with a lower intensity (<100 kW/cm2), extracting a high electron density by direct photoelectric effect
Keywords :
laser beam applications; laser beam effects; photocathodes; photoemission; photoemissive devices; FIR laser; IR laser; UV laser; conduction electron energy; direct photoelectric effect; effective photoelectric quantum yield; far-infrared; high electron density; high-density source; infrared; laser action; low intensity; low-frequency; material surface; metal photocathodes; potential barrier; ultraviolet laser; very-high-electron-density emission; visible laser; Cathodes; Electron beams; Electron emission; Frequency; Guns; Laser beams; Optical pulses; Production; Surface emitting lasers; Vacuum systems;
fLanguage :
English
Journal_Title :
Electrical Insulation, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9367
Type :
jour
DOI :
10.1109/14.46337
Filename :
46337
Link To Document :
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