DocumentCode :
875799
Title :
A new cell structure for very thin high-efficiency silicon solar cells
Author :
Uematsu, Tsuyoshi ; Ida, Minoru ; Hane, Kunio ; Kokunai, Shigeru ; Saitoh, Tadashi
Author_Institution :
Hitachi Ltd., Tokyo, Japan
Volume :
37
Issue :
2
fYear :
1990
fDate :
2/1/1990 12:00:00 AM
Firstpage :
344
Lastpage :
347
Abstract :
The cell has a corrugated structure, which is formed by aligned V grooves on both the front and back surfaces. The substrate thickness is reduced to 50 μm while retaining high mechanical strength. This permits ease of handling during the fabrication process and subsequent procedures. This thin substrate promises a very high open-circuit voltage, and the structure is also beneficial to high optical performance. The surface reflectance is reduced in the same manner as that of V-grooved cells, but the optical path is lengthened by a minimum of four times the substrate thickness. Performance of experimental cells is also discussed
Keywords :
elemental semiconductors; silicon; solar cells; Si; aligned V grooves; cell structure; corrugated structure; ease of handling; experimental cells; high efficiency solar cells; high mechanical strength; high open-circuit voltage; high optical performance; optical path; semiconductors; substrate thickness; surface reflectance; thin substrate; Charge carrier lifetime; Corrugated surfaces; Etching; Laboratories; Optical device fabrication; Photovoltaic cells; Reflectivity; Silicon; Stress; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.46363
Filename :
46363
Link To Document :
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