• DocumentCode
    876219
  • Title

    V-shaped test patterns for measuring lateral diffusion

  • Author

    Mar, Jeich

  • Volume
    6
  • Issue
    6
  • fYear
    1971
  • fDate
    12/1/1971 12:00:00 AM
  • Firstpage
    419
  • Lastpage
    421
  • Abstract
    Two new integrated circuit test patterns using V-shaped resistors are presented for measuring lateral diffusion underneath an oxide mask. The patterns require only nondestructive optical and d.c. electrical measurements, and can be fabricated in less than 50 mils/SUP 2/ of silicon. Experimental results show the measurement precision to be ±2×10/SUP -5/ cm.
  • Keywords
    Diffusion; Integrated circuit testing; diffusion; integrated circuit testing; Capacitance measurement; Electric variables measurement; Electrons; Integrated circuit measurements; Lighting; Quantum capacitance; Semiconductor diodes; Silicon; Testing; Voltage;
  • fLanguage
    English
  • Journal_Title
    Solid-State Circuits, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9200
  • Type

    jour

  • DOI
    10.1109/JSSC.1971.1050219
  • Filename
    1050219
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=876219