Title :
High-performance low-power CMOS memories using silicon-on-sapphire technology
Author :
Boleky, E.J. ; Meyer, John E.
fDate :
4/1/1972 12:00:00 AM
Abstract :
Complementary MOS silicon-on-sapphire inverters fabricated using silicon-gate technology and 5-μm channel-length devices has achieved nanosecond propagation delays and picojoule dynamic power-x delay products. In addition to high switching speed and low dynamic power, inverters with low leakage currents and therefore low quiescent power have been obtained. Two complex CMOS/SOS memories that realize the performance attributes of the individual inverters have been fabricated. An aluminium-gate 256-bit fully decoded static random-access memory features a typical access time of 50 ns at 10 V with a power dissipation of 0.4 μW/bit (quiescent) and 10 μW/bit (dynamic). The access time at 5 V is typically 95 ns. A silicon-gate 256-bit dynamic shift register features operation at clock signals of 200 MHz at 10 V and 75 MHz at 5 V. The dynamic power dissipation at 50 MHz and 5 V is typically 90 μW/bit.
Keywords :
Metal-insulator-semiconductor devices; Semiconductor materials; Semiconductor storage devices; metal-insulator-semiconductor devices; semiconductor materials; semiconductor storage devices; CMOS technology; Integrated circuit technology; Inverters; Laboratories; Leakage current; MOSFETs; Parasitic capacitance; Power dissipation; Propagation delay; Silicon;
Journal_Title :
Solid-State Circuits, IEEE Journal of
DOI :
10.1109/JSSC.1972.1050259