DocumentCode :
878257
Title :
Etch slope compensation for planar silica waveguide lens pair
Author :
Mackenzie, M. ; Kwok, C.Y. ; Michael, A. ; Yu, K. ; Kaalund, C.
Author_Institution :
Sch. of Electr. Eng. & Technol., UNSW, Sydney, NSW, Australia
Volume :
42
Issue :
6
fYear :
2006
fDate :
3/16/2006 12:00:00 AM
Firstpage :
345
Lastpage :
346
Abstract :
A silica lens pair has been designed to facilitate the free-space optical propagation between opposing planar waveguides. Each lens consists of a graded refractive index slab with a convexly shaped front face. A technique for compensating for the non-vertical etch of the front face curvature is described and shown to result in a significant reduction of optical loss.
Keywords :
compensation; gradient index optics; lenses; optical planar waveguides; refractive index; sputter etching; PECVD; RIE techniques; convexly shaped front face; etch slope compensation; free-space optical propagation; front face curvature; graded refractive index slab; planar waveguides; silica lens pair;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:20064434
Filename :
1610422
Link To Document :
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