DocumentCode
879129
Title
Using proton irradiation to probe the origins of low-frequency noise variations in SiGe HBTs
Author
Jin, Zhenrong ; Johansen, Jarle A. ; Cressler, John D. ; Reed, Robert A. ; Marshall, Paul W. ; Joseph, Alvin J.
Author_Institution
Sch. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
Volume
50
Issue
6
fYear
2003
Firstpage
1816
Lastpage
1820
Abstract
We use proton irradiation to probe the origins of the geometry-dependent variation of low-frequency noise in 120 GHz SiGe heterojunction bipolar transistors (HBTs). Before irradiation, small-sized transistors show a strong variation in noise magnitude across many samples, whereas the noise in larger devices is more statistically reproducible. Although the noise magnitude shows little degradation after 2×1013 p/cm2 irradiation, the observed noise variation decreases. Its dependence on both geometry and bias is quantified. This fundamental geometrical scaling effect is investigated using theoretical calculations based on the superposition of generation/recombination (G/R) noise sources.
Keywords
1/f noise; Ge-Si alloys; current density; heterojunction bipolar transistors; millimetre wave bipolar transistors; proton effects; radiation hardening (electronics); semiconductor device noise; 120 GHz; SiGe; additional traps; base current density; generation/recombination noise sources; geometry-dependent variation; heterojunction bipolar transistor; low-frequency noise; noise magnitude; noise variation; proton irradiation probe; Circuit noise; Frequency; Germanium silicon alloys; Heterojunction bipolar transistors; Low-frequency noise; Microelectronics; Probes; Protons; Semiconductor device noise; Silicon germanium;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.2003.820739
Filename
1263805
Link To Document