• DocumentCode
    88067
  • Title

    Threshold Voltage Design and Performance Assessment of Hetero-Channel SRAM Cells

  • Author

    Hu, Vita Pi-Ho ; Fan, Ming-Long ; Su, Pin ; Chuang, Ching-Te

  • Author_Institution
    Dept. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
  • Volume
    60
  • Issue
    1
  • fYear
    2013
  • fDate
    Jan. 2013
  • Firstpage
    147
  • Lastpage
    152
  • Abstract
    Optimized threshold voltage (Vt) design to enhance the variation immunity of high-performance (super-threshold) and low-voltage (near-/sub-threshold) 6 T SRAM cells is presented. For low-voltage SRAM cells operating at low Vdd, low-Vt design shows smaller variability, while the design tradeoff between performance and leakage should be considered. For high-performance SRAM cells operating at high Vdd, ultra-thin-body SOI SRAM cells with high-Vt design show smaller variability while sacrificing performance compared with the low-Vt design. Our study indicates that hetero-channel SRAM cells enable high-Vt design and exhibit improved Read/Write stability and performance, and maintain comparable RSNM variations for the high-performance SRAM applications.
  • Keywords
    SRAM chips; low-power electronics; silicon-on-insulator; Si; hetero-channel SRAM cells; low-voltage 6 T SRAM cells; optimized threshold voltage design; read/write stability; super-threshold 6 T SRAM cells; ultra-thin-body SOI SRAM cells; variation immunity; MOSFETs; Performance evaluation; Stability analysis; Tunneling; Wireless sensor networks; Hetero-channel; SRAM; performance; variability;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2012.2228863
  • Filename
    6376153