DocumentCode :
880902
Title :
Bias Annealing of Radiation and Bias Induced Positive Charges in N- and P-Type MOS Capacitors
Author :
Suzuki, Kazumichi ; Sakagami, Masaharu ; Nishimura, Eiichi ; Watanabe, Kikuo
Author_Institution :
Energy Research Laboratory, Hitachi Ltd. Hitachi, Ibaraki 316, Japan
Volume :
32
Issue :
6
fYear :
1985
Firstpage :
3911
Lastpage :
3915
Abstract :
The radiation-induced positive charges trapped in an n-type MDS capacitor were observed to decrease with the number of C-V measurements. The positive gate bias applied on the capacitor was found to cause the decrease in the trapped charges. Its proposed mechanism was a recombination of the trapped positive charges with electrons injected from the Si substrate into the SiO2 layer due to the bias.
Keywords :
Annealing; Capacitance-voltage characteristics; Current measurement; Electron traps; Ferroelectric films; Laboratories; MOS capacitors; Nonvolatile memory; Random access memory; State estimation;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1985.4334042
Filename :
4334042
Link To Document :
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