DocumentCode :
881100
Title :
Millimeter Resonance Isolator Using Chemically Deposited Ferrite Films (Correspondence)
Author :
Wade, W. ; Collins, Thomas ; Stern, Raivo
Volume :
10
Issue :
6
fYear :
1962
fDate :
11/1/1962 12:00:00 AM
Firstpage :
611
Lastpage :
611
Abstract :
An experimental resonanre isolator showing the feasibility of newly developed chemically deposited ferrite films, was made in the 35-Gc region. Included in this letter are two graphs showing the isolation characteristics that were obtained and also a brief description of the film preparation techniques.
Keywords :
Chemicals; Dielectrics; Ferrite films; Gaussian processes; Isolators; Magnetic field measurement; Magnetic films; Nickel; Resonance; Substrates;
fLanguage :
English
Journal_Title :
Microwave Theory and Techniques, IRE Transactions on
Publisher :
ieee
ISSN :
0097-2002
Type :
jour
DOI :
10.1109/TMTT.1962.1125576
Filename :
1125576
Link To Document :
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