DocumentCode :
881279
Title :
AlGaInP/GaInAs strained quantum well lasers
Author :
Yoshida, Isao ; Katsuyama, Tomokazu ; Hashimoto, Jun ; Hayashi, H.
Author_Institution :
Sumitoma Electric Industries Ltd., Yokohama, Japan
Volume :
29
Issue :
8
fYear :
1993
fDate :
4/15/1993 12:00:00 AM
Firstpage :
654
Lastpage :
655
Abstract :
AlGaInP cladding layers have been applied for the first time to GaInAs strained quantum well lasers oscillating around 0.98 mu m. The device has lower threshold current and larger T0 than a device with GaInP cladding layers. This was expected from a larger bandgap difference between active and cladding layers.
Keywords :
III-V semiconductors; aluminium compounds; claddings; gallium arsenide; gallium compounds; indium compounds; semiconductor lasers; 0.98 micron; 3 to 40 mA; AlGaInP-GaInAs; active layers; bandgap difference; cladding layers; optical output characteristics; strained quantum well lasers; threshold current;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19930438
Filename :
209930
Link To Document :
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