DocumentCode
881279
Title
AlGaInP/GaInAs strained quantum well lasers
Author
Yoshida, Isao ; Katsuyama, Tomokazu ; Hashimoto, Jun ; Hayashi, H.
Author_Institution
Sumitoma Electric Industries Ltd., Yokohama, Japan
Volume
29
Issue
8
fYear
1993
fDate
4/15/1993 12:00:00 AM
Firstpage
654
Lastpage
655
Abstract
AlGaInP cladding layers have been applied for the first time to GaInAs strained quantum well lasers oscillating around 0.98 mu m. The device has lower threshold current and larger T0 than a device with GaInP cladding layers. This was expected from a larger bandgap difference between active and cladding layers.
Keywords
III-V semiconductors; aluminium compounds; claddings; gallium arsenide; gallium compounds; indium compounds; semiconductor lasers; 0.98 micron; 3 to 40 mA; AlGaInP-GaInAs; active layers; bandgap difference; cladding layers; optical output characteristics; strained quantum well lasers; threshold current;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19930438
Filename
209930
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