DocumentCode :
881690
Title :
Novel sub-100 nm thin film transistors
Author :
Franssila, S. ; Paloheimo, J. ; Kuivalainen, P.
Author_Institution :
Tech. Res. Centre of Finland, Espoo, Finland
Volume :
29
Issue :
8
fYear :
1993
fDate :
4/15/1993 12:00:00 AM
Firstpage :
713
Lastpage :
714
Abstract :
A new method is introduced for fabricating metal electrodes for thin film field-effect transistors having a source to drain distance in the sub-100 nm range. The method is based on a liftoff process with sidewall spacers and it is demonstrated by fabricating sub-100 nm polymer transistors. These are to the authors´ knowledge the smallest polymer transistors reported.
Keywords :
field effect transistors; metallisation; photolithography; polymer films; thin film transistors; 1 to 100 micron; FET; MOSFET; TFT; field-effect transistors; liftoff process; metal electrodes; polymer transistors; sidewall spacers; thin film transistors;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19930477
Filename :
209970
Link To Document :
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