Title :
Novel sub-100 nm thin film transistors
Author :
Franssila, S. ; Paloheimo, J. ; Kuivalainen, P.
Author_Institution :
Tech. Res. Centre of Finland, Espoo, Finland
fDate :
4/15/1993 12:00:00 AM
Abstract :
A new method is introduced for fabricating metal electrodes for thin film field-effect transistors having a source to drain distance in the sub-100 nm range. The method is based on a liftoff process with sidewall spacers and it is demonstrated by fabricating sub-100 nm polymer transistors. These are to the authors´ knowledge the smallest polymer transistors reported.
Keywords :
field effect transistors; metallisation; photolithography; polymer films; thin film transistors; 1 to 100 micron; FET; MOSFET; TFT; field-effect transistors; liftoff process; metal electrodes; polymer transistors; sidewall spacers; thin film transistors;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19930477