DocumentCode :
882102
Title :
Poly-Si TFTs with asymmetric dual-gate for kink current reduction
Author :
Lee, Min-Cheol ; Han, Min-Koo
Author_Institution :
Sch. of Electr. Eng., Seoul Nat. Univ., South Korea
Volume :
25
Issue :
1
fYear :
2004
Firstpage :
25
Lastpage :
27
Abstract :
Poly-Si thin-film transistors (TFTs) with an asymmetric dual-gate, which reduces the kink current considerably, have been proposed and fabricated without any additional mask. Asymmetric dual-gate TFTs consist of a long gate and a short gate, which are located near the source and the drain, respectively. In the saturation regime, the short gate would induce the pinchoff near the drain, while the long gate may operate in the linear mode so that the kink effect only occurs at the channel under short gate. We have successfully fabricated asymmetric dual-gate TFTs and experimental results show that the kink current is successfully reduced. We also performed numerical simulation of electrical potential at the floated n+ region in order to verify the experimental result.
Keywords :
leakage currents; silicon compounds; thin film transistors; asymmetric dual-gate; drain source; electrical potential; kink current reduction; masking; numerical simulation; pinchoff reduction; thin-film transisitors; Active matrix organic light emitting diodes; Annealing; Chemical lasers; Electric potential; Fingers; Immune system; Leakage current; Numerical simulation; Organic light emitting diodes; Thin film transistors;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2003.821670
Filename :
1264103
Link To Document :
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