DocumentCode
882102
Title
Poly-Si TFTs with asymmetric dual-gate for kink current reduction
Author
Lee, Min-Cheol ; Han, Min-Koo
Author_Institution
Sch. of Electr. Eng., Seoul Nat. Univ., South Korea
Volume
25
Issue
1
fYear
2004
Firstpage
25
Lastpage
27
Abstract
Poly-Si thin-film transistors (TFTs) with an asymmetric dual-gate, which reduces the kink current considerably, have been proposed and fabricated without any additional mask. Asymmetric dual-gate TFTs consist of a long gate and a short gate, which are located near the source and the drain, respectively. In the saturation regime, the short gate would induce the pinchoff near the drain, while the long gate may operate in the linear mode so that the kink effect only occurs at the channel under short gate. We have successfully fabricated asymmetric dual-gate TFTs and experimental results show that the kink current is successfully reduced. We also performed numerical simulation of electrical potential at the floated n+ region in order to verify the experimental result.
Keywords
leakage currents; silicon compounds; thin film transistors; asymmetric dual-gate; drain source; electrical potential; kink current reduction; masking; numerical simulation; pinchoff reduction; thin-film transisitors; Active matrix organic light emitting diodes; Annealing; Chemical lasers; Electric potential; Fingers; Immune system; Leakage current; Numerical simulation; Organic light emitting diodes; Thin film transistors;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2003.821670
Filename
1264103
Link To Document