• DocumentCode
    882102
  • Title

    Poly-Si TFTs with asymmetric dual-gate for kink current reduction

  • Author

    Lee, Min-Cheol ; Han, Min-Koo

  • Author_Institution
    Sch. of Electr. Eng., Seoul Nat. Univ., South Korea
  • Volume
    25
  • Issue
    1
  • fYear
    2004
  • Firstpage
    25
  • Lastpage
    27
  • Abstract
    Poly-Si thin-film transistors (TFTs) with an asymmetric dual-gate, which reduces the kink current considerably, have been proposed and fabricated without any additional mask. Asymmetric dual-gate TFTs consist of a long gate and a short gate, which are located near the source and the drain, respectively. In the saturation regime, the short gate would induce the pinchoff near the drain, while the long gate may operate in the linear mode so that the kink effect only occurs at the channel under short gate. We have successfully fabricated asymmetric dual-gate TFTs and experimental results show that the kink current is successfully reduced. We also performed numerical simulation of electrical potential at the floated n+ region in order to verify the experimental result.
  • Keywords
    leakage currents; silicon compounds; thin film transistors; asymmetric dual-gate; drain source; electrical potential; kink current reduction; masking; numerical simulation; pinchoff reduction; thin-film transisitors; Active matrix organic light emitting diodes; Annealing; Chemical lasers; Electric potential; Fingers; Immune system; Leakage current; Numerical simulation; Organic light emitting diodes; Thin film transistors;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2003.821670
  • Filename
    1264103