• DocumentCode
    882899
  • Title

    Extraction of channel length and junction voltage in n+/n/n+ or n+/p/n+ polysilicon resistors

  • Author

    Rodder, Mark ; Madan, Sudhir K.

  • Author_Institution
    Texas Instrum. Inc., Dallas, TX, USA
  • Volume
    39
  • Issue
    8
  • fYear
    1992
  • fDate
    8/1/1992 12:00:00 AM
  • Firstpage
    1968
  • Lastpage
    1970
  • Abstract
    A method for extraction of channel length and junction voltage of poly-Si resistors is presented. Direct extraction of channel length can be performed for n+/n/n+ resistors operating in the nonlinear I-V regime. However, poly-Si resistors may have channel doping opposite to that of the source/drain doping. For this case, a method is presented for extraction of the current-dependent voltage drop across the drain n+/p junction. Importantly, this junction voltage drop can be an appreciable fraction of the drain-to-source bias and thus is important for correct analysis of n+/p/n+ resistors
  • Keywords
    elemental semiconductors; semiconductor device models; semiconductor junctions; silicon; thin film resistors; channel doping; channel length; current-dependent voltage drop; junction voltage; modelling; n+/n/n+ resistors; n+/p/n+ resistors; nonlinear I-V regime; polycrystalline Si resistors; semiconductor; source/drain doping; Doping; Electron devices; Etching; Implants; Instruments; Process design; Random access memory; Resistors; Semiconductor process modeling; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.144692
  • Filename
    144692