Title :
Improved VBIC model for SiGe HBTs with an unified model of heterojunction barrier effects
Author :
Lee, Kyungho ; Cho, Dae-Hyung ; Park, Kang-Wook ; Kim, Bumman
Author_Institution :
Dept. of Electr. Eng., Pohang Univ. of Sci. & Technol., South Korea
fDate :
4/1/2006 12:00:00 AM
Abstract :
An improved bipolar transistor model considering heterojunction barrier effect (HBE) in SiGe double heterojunction bipolar transistors is developed. The effect of barrier formation due to high level injection, which is related to the rapid degradations of the dc current gain (β) and cutoff frequency (fT), is carefully investigated and analyzed. As the collector current becomes high, the conduction band barrier is induced and increased. It causes the saturation of collector current (JC) due to the blocking of carrier transport, the sharp increase of base transit time (τB) due to the additional charge storage, the increase of base current (JB) due to the increased recombination, and the decrease of intrinsic base resistance (Rbi) due to the increased charge and base pushout. Those phenomena are included into a vertical bipolar intercompany model (VBIC) compact model by employing a unified model of the HBE on JC, JB, τB, and Rbi. Furthermore, portions of τB and Rbi from the Kirk effect itself are modeled according to the high current model description and the new formulation of widened base, respectively. A full extraction of parameters has been performed and the modified VBIC model is applied. The modeling accuracy is significantly improved at the high current region for the dc and RF characteristics.
Keywords :
heterojunction bipolar transistors; semiconductor device models; Kirk effect; SiGe; bipolar transistor model; carrier transport; heterojunction barrier effects; heterojunction bipolar transistors; vertical bipolar intercompany model; Bipolar transistors; Current measurement; Degradation; Double heterojunction bipolar transistors; Germanium silicon alloys; Heterojunction bipolar transistors; Kirk field collapse effect; Large scale integration; Radio frequency; Silicon germanium; Double heterojunction bipolar transistors (DHBTs); SiGe HBTs; heterojunction barrier effect (HBE); high current effect; intrinsic base resistance; transit time; vertical bipolar intercompany model (VBIC) model;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2006.871194