Title :
Submicron patterning of surfaces
Author :
Hosack, Harold H. ; Dyck, Rudolph H.
fDate :
8/1/1977 12:00:00 AM
Abstract :
A new process for providing submicron patterning of surfaces is presented. This processing technique, which the authors call the Iso-E process, is capable of producing submicron openings to the surface of materials using conventional photolithographic techniques and processing common to the semiconductor industry. This process can be used equally well with X-ray or electron-beam lithography to provide minimum geometry openings at minimum geometry spacings.
Keywords :
Integrated circuit technology; Photolithography; Semiconductor technology; integrated circuit technology; photolithography; semiconductor technology; Cameras; Electronics industry; Etching; Geometry; Instruments; Lithography; Protection; Semiconductor materials; Substrates;
Journal_Title :
Solid-State Circuits, IEEE Journal of
DOI :
10.1109/JSSC.1977.1050915
