• DocumentCode
    884297
  • Title

    Implantation of Intense Pulsed Metallic Ion Beam

  • Author

    Jiang, X.L. ; Jiang, S.C. ; Chen, K.F. ; Wang, T.M.

  • Author_Institution
    Lanzhou University, Lanzhou, China
  • Volume
    32
  • Issue
    5
  • fYear
    1985
  • Firstpage
    3341
  • Lastpage
    3343
  • Abstract
    The short-duration intense mixed metallic and gaseous ion beams, such as Ti* and N+, produced by the multiplate cnamber with central hole have been used for implantation. The compositions of titanium and nitrogen as a function of depth was determined using Auger electron spectroscopy PHI-550. It is proved that phase transitions of thin layer of steel bombarded by ion beams take place owing to the ion mixing and rapid cooling down of implanted area after melting by the pulsed beams with power density more than 107W/cm2. The effective hardness increase is concluded from microhardness measurements. It is expected that the implantation with pulsed ion beam could open a new way for the significant industrial application.1
  • Keywords
    Atomic beams; Doping; Electrons; Ion beams; Iron; Nitrogen; Sputtering; Steel; Surface resistance; Titanium;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1985.4334363
  • Filename
    4334363