DocumentCode
884714
Title
High Density CID Imagers
Author
Brown, Dale M. ; Ghezzo, Mario ; Sargent, Paul L.
Volume
13
Issue
1
fYear
1978
fDate
2/1/1978 12:00:00 AM
Firstpage
5
Lastpage
10
Abstract
The fabrication and performance of large (16K, 60K, and 78K cells) high density CID self-scanned imager arrays is described. Array fabrication used overlapping electrodes of two levels of polysilicon or a first level of polysilicon and a second level of antimony tin oxide. Yield considerations and the special processing steps required to fabricate these large chips are examined. Quantum efficiency curves of these structures are compared.
Keywords
Charge-coupled device circuits; Image sensors; Aluminum; Annealing; Circuits; Clocks; Dark current; Electrodes; Fabrication; Hydrogen; Research and development; Tin;
fLanguage
English
Journal_Title
Solid-State Circuits, IEEE Journal of
Publisher
ieee
ISSN
0018-9200
Type
jour
DOI
10.1109/JSSC.1978.1050988
Filename
1050988
Link To Document