DocumentCode :
885337
Title :
Measurement of a planar discharge and its interaction with a neutral background gas
Author :
Gregor, Joseph A. ; Fernsler, Richard F. ; Meger, Robert A.
Author_Institution :
Nat. Transp. Safety Board, Washington, DC, USA
Volume :
31
Issue :
6
fYear :
2003
Firstpage :
1305
Lastpage :
1312
Abstract :
The evolution of a weakly ionized magnetized sheet plasma generated in 100-200 mtorr air has been investigated. A 1.2×50 cm hollow cathode imbedded in a 250 Gauss magnetic field was used to produce a 50×60 ×2-cm planar plasma sheet with an electron density ne≅1012 cm-3. Such plasmas have applications in microwave beam steering and plasma processing. Time-resolved measurements of the discharge parameters, local electric field, electron density and temperature, optical emissions, and microwave transmission show the effects of neutral gas heating on formation of the plasma. A beam-generated negative glow discharge was formed at low neutral gas density and high beam voltage. At higher gas densities and lower beam voltages, a positive column discharge sustained by avalanche ionization formed in the region near the anode. For pulsed discharges with t>150 μs, a transition from the positive column to the negative glow mode was observed due to heating of the neutral gas.
Keywords :
current density; glow discharges; plasma density; plasma probes; plasma temperature; positive column; 100 to 200 mtorr; 250 G; avalanche ionization; beam-generated negative glow discharge; electron density; electron temperature; floating probe measurements; high beam voltage; hollow cathode; local electric field; low neutral gas density; magnetic field; microwave beam steering; microwave transmission; neutral background gas interaction; optical emissions; planar discharge; plasma processing; plasma-sheet formation; positive column discharge; time-resolved measurements; weakly ionized magnetized sheet plasma; Cathodes; Electromagnetic heating; Gaussian processes; Magnetic field measurement; Plasma applications; Plasma density; Plasma materials processing; Plasma measurements; Plasma temperature; Voltage;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2003.820965
Filename :
1264907
Link To Document :
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