DocumentCode :
885698
Title :
Kink-related noise overshoot in SOI n-MOSFETs operating at 4.2 K
Author :
Simoen, Eddy ; Dierickx, B. ; Claeys, Cor
Author_Institution :
IMEC, Leuven, Belgium
Volume :
28
Issue :
6
fYear :
1992
fDate :
3/12/1992 12:00:00 AM
Firstpage :
577
Lastpage :
579
Abstract :
The low frequency noise behaviour of SOI n-MOSFETs operated at 4.2 K is reported for the first time and compared with room temperature behaviour. It is shown that the noise level increases by a factor of 3-5, and the kink-related noise overshoot become much more pronounced on cooling. These results are compared with the noise overshoot observed in bulk devices operating at 4.2 K and a similar explanation for the phenomenon is proposed.
Keywords :
cryogenics; electron device noise; insulated gate field effect transistors; semiconductor-insulator boundaries; 4.2 K; LF noise; NMOSFET; SOI n-MOSFETs; kink-related noise overshoot; low frequency noise behaviour; n-channel device;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19920364
Filename :
126509
Link To Document :
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