Title :
Measurement of excess loss in planar silica X junctions
Author :
Mackenzie, F. ; Beaumont, C.J. ; Nield, M. ; Cassidy, S.A.
Author_Institution :
BT Labs., Ipswich, UK
Abstract :
Planar silica provides a compact and stable medium for the fabrication of optical delay lines for signal processing applications. One particularly compact design involves the use of 90 degrees crossovers (X junctions) to allow coiling of buried channel waveguides to form the delay line without the discontinuity loss associated with loopback structures. The authors present measurements of the excess loss due to these and compare the results with theoretical treatment.
Keywords :
delay lines; optical losses; optical waveguide components; optical waveguide theory; silicon compounds; 90 degrees crossovers; SiO 2; buried channel waveguides; excess loss; planar silica X junctions;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19921228
