• DocumentCode
    886639
  • Title

    Total Dose Hardness Assurance for Microcircuits for Space Environment

  • Author

    Buchman, Paltiel

  • Author_Institution
    The Aerospace Corporation P. O. Box 92957 Los Angeles, CA 90009
  • Volume
    33
  • Issue
    6
  • fYear
    1986
  • Firstpage
    1352
  • Lastpage
    1358
  • Abstract
    A hardness assurance procedure is being developed that can be used to predict the degradation of certain CMOS microcircuits in space environment based on the results of total dose testing at high dose rate. The procedure includes heating the device, following irradiation, at specified temperature, time, and bias conditions. The interface state charge density is shown to vary inversely with dose rate. Therefore a correction in device hardness is required for space applications due to the increase in interface state charges at low dose rates. The annealing of oxide and interface state traps follows a first order reaction with an activation energy of 0.2 eV and 0.6 eV respectively.
  • Keywords
    Annealing; CMOS technology; Degradation; Heating; Interface states; Manufacturing; Radiation hardening; Space charge; Temperature; Testing;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1986.4334604
  • Filename
    4334604