DocumentCode
886750
Title
Transient Hardened Power FETS
Author
Dawes, W.R., Jr. ; Fischer, T.A. ; Huang, C.C-C ; Meyer, W.J. ; Smith, C.S. ; Blanchard, R.A. ; Fortier, T.J.
Author_Institution
Sandia National Laboratories P. O. Box 5800 Albuquerque, NM 87185
Volume
33
Issue
6
fYear
1986
Firstpage
1425
Lastpage
1427
Abstract
N-channel power FETs offer significant advantages in power conditioning circuits. Similarly to all MOS technologies, power FET devices are vulnerable to ionizing radiation, and are particularly susceptible to burn-out in high dose rate irradiations (>1E10 rad(Si)/s), which precludes their use in many military environments. This paper will sumnarize the physical mechanisms responsible for burn-out, and discuss various fabrication techniques designed to improve the transient hardness of power FETs. Power FET devices were fabricated with several of these techniques, and data will be presented which demonstrates that transient hardness levels in excess of lE12 rad(Si)/s are easily achievable.
Keywords
Circuit testing; Electric variables; FETs; Fabrication; Ionizing radiation; Laboratories; Photoconductivity; Power conditioning; Radiation hardening; Voltage;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.1986.4334617
Filename
4334617
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