• DocumentCode
    886750
  • Title

    Transient Hardened Power FETS

  • Author

    Dawes, W.R., Jr. ; Fischer, T.A. ; Huang, C.C-C ; Meyer, W.J. ; Smith, C.S. ; Blanchard, R.A. ; Fortier, T.J.

  • Author_Institution
    Sandia National Laboratories P. O. Box 5800 Albuquerque, NM 87185
  • Volume
    33
  • Issue
    6
  • fYear
    1986
  • Firstpage
    1425
  • Lastpage
    1427
  • Abstract
    N-channel power FETs offer significant advantages in power conditioning circuits. Similarly to all MOS technologies, power FET devices are vulnerable to ionizing radiation, and are particularly susceptible to burn-out in high dose rate irradiations (>1E10 rad(Si)/s), which precludes their use in many military environments. This paper will sumnarize the physical mechanisms responsible for burn-out, and discuss various fabrication techniques designed to improve the transient hardness of power FETs. Power FET devices were fabricated with several of these techniques, and data will be presented which demonstrates that transient hardness levels in excess of lE12 rad(Si)/s are easily achievable.
  • Keywords
    Circuit testing; Electric variables; FETs; Fabrication; Ionizing radiation; Laboratories; Photoconductivity; Power conditioning; Radiation hardening; Voltage;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1986.4334617
  • Filename
    4334617