• DocumentCode
    886858
  • Title

    Total Dose Effects at Low Dose Rates

  • Author

    Johnston, Allan H. ; Roeske, Stanley B.

  • Author_Institution
    Boeing Aerospace Company Seattle, WA 98124
  • Volume
    33
  • Issue
    6
  • fYear
    1986
  • Firstpage
    1487
  • Lastpage
    1492
  • Abstract
    The effects of irradiation at very low dose rates are discussed for hardened CMOS devices from two different manufacturers. For some devices, rate effects were important even at dose rates of 0.04 rad(Si)/s, so that even lower dose rates may be required to characterize their behavior for some applications. Modeling approaches for low dose rates are discussed, and linearity of the charge generation processes is shown to be an important factor in modeling. Interface state generation for one process was highly nonlinear, which reduced the impact of annealing and super recovery on device hardness.
  • Keywords
    Annealing; Circuits; Interface states; Laboratories; Linearity; Manufacturing; Region 1; Region 2; Region 3; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1986.4334628
  • Filename
    4334628