DocumentCode
886858
Title
Total Dose Effects at Low Dose Rates
Author
Johnston, Allan H. ; Roeske, Stanley B.
Author_Institution
Boeing Aerospace Company Seattle, WA 98124
Volume
33
Issue
6
fYear
1986
Firstpage
1487
Lastpage
1492
Abstract
The effects of irradiation at very low dose rates are discussed for hardened CMOS devices from two different manufacturers. For some devices, rate effects were important even at dose rates of 0.04 rad(Si)/s, so that even lower dose rates may be required to characterize their behavior for some applications. Modeling approaches for low dose rates are discussed, and linearity of the charge generation processes is shown to be an important factor in modeling. Interface state generation for one process was highly nonlinear, which reduced the impact of annealing and super recovery on device hardness.
Keywords
Annealing; Circuits; Interface states; Laboratories; Linearity; Manufacturing; Region 1; Region 2; Region 3; Threshold voltage;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.1986.4334628
Filename
4334628
Link To Document