DocumentCode :
886935
Title :
Factors Contributing to Cmos Static Ram Upset
Author :
Ackermann, M.R. ; Mikawa, R.E. ; Massengill, L.W. ; Diehl, S.E.
Author_Institution :
Sandia National Laboratories Albuquerque, NM 87185
Volume :
33
Issue :
6
fYear :
1986
Firstpage :
1524
Lastpage :
1529
Abstract :
Phenomena contributing to transient radiation induced static RAM (SRAM) cell upset in CMOS integrated circuits (ICs) include rail span collapse, dynamic FET threshold voltage shifts, photocurrents internal to the RAM cell, secondary photocurrents, and lateral variations in silicon surface potential. Of these phenomena, it is found that the major contributors are rail span collapse and internal cell photocurrents. A model is presented which combines global rail span collapse calculations with detailed analyses of local effects in the ram cell.
Keywords :
Circuit simulation; Integrated circuit modeling; P-n junctions; Photoconductivity; Predictive models; Rails; Random access memory; Read-write memory; Semiconductor device modeling; Threshold voltage;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1986.4334635
Filename :
4334635
Link To Document :
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