• DocumentCode
    888729
  • Title

    MOS voltage reference based on polysilicon gate work function difference

  • Author

    Oguey, Henri J. ; Gerber, Bernard

  • Volume
    15
  • Issue
    3
  • fYear
    1980
  • fDate
    6/1/1980 12:00:00 AM
  • Firstpage
    264
  • Lastpage
    269
  • Abstract
    A voltage reference in CMOS technology is based upon transistor pairs of the same type except for the opposite doping type of their polysilicon gates. At identical drain currents, the gate voltage difference, close to the silicon bandgap, is 1.2 V/spl plusmn/0.06 V. Circuits for a positive and for a negative voltage reference are presented. Digital voltage tuning improves accuracy. Temperature compensation is provided by proper choice of current ratio or by means of an auxiliary circuit. Voltage drift is about 300 ppm//spl deg/C without compensation, and can be reduced to /spl plusmn/30 ppm//spl deg/C. The circuits work with a supply voltage of 2-10 V and draw a current that is less than 1 /spl mu/A.
  • Keywords
    Field effect integrated circuits; Reference circuits; field effect integrated circuits; reference circuits; CMOS technology; Circuit optimization; Conductivity; Doping; Integrated circuit technology; MOSFETs; Photonic band gap; Silicon; Temperature dependence; Voltage;
  • fLanguage
    English
  • Journal_Title
    Solid-State Circuits, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9200
  • Type

    jour

  • DOI
    10.1109/JSSC.1980.1051381
  • Filename
    1051381